on front Physical deposition |
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Process characteristics: |
Material Material to be deposited.
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Microstructure Specify preferred microstructure of deposited film (if known). |
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Residual stress Specify preferred residual stress in deposited film (if known). Positive values refer to tensile film stress.
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Sides processed Specify whether deposition is to occur on a single or both sides of substrate. |
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Thickness Thickness of film to be deposited. |
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Equipment |
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