Photoresist hardbake (102 degC) |
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| Ambient Ambient to which substrate is exposed during processing |
air |
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| Batch size |
24 |
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| Pressure Pressure of process chamber during processing |
1 atm |
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| Sides processed |
both |
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| Temperature |
102 °C |
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| Thermal duration |
30 min |
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| Wafer size |
|
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| Equipment |
Lindberg/Blue M mechanical oven |
| Equipment characteristics: |
| Wafer holder Device that holds the wafers during processing. |
quartz boat |
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| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, glass (category) |
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| Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 800 µm |
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| Comments: |
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