on front Sheet resistance measurement |
|
Batch size |
1 |
Current |
0.453 mA |
Measurement aspect |
resistivity |
Measurement unit |
Ohm/square |
Setup time |
30 min |
Sides inspected The sides of the wafer inspected by the process |
either |
Wafer size |
|
Equipment |
4-Point Probe |
Equipment characteristics: |
Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat |
Wafer holder Device that holds the wafers during processing. |
teflon chuck |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon |
Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 1000 µm |
Comments: |
|