Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
on front
  Post-implant photoresist strip (non-metal)
on front
  1 Resist ash
Materialphotoresist (category)
  2 Photoresist strip (non-metal)
Materialphotoresist (category)
Wafer size
Wafer size
Comments:
  • May need to repeat to completely remove resist.