Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
on front
  Al/2% Si DC-magnetron sputtering
on front
  1 Al/2% Si DC-magnetron sputtering
Materialaluminum/silicon [98:2]
on front
  2 Stylus profilometer step measurement
Process characteristics:
Thickness
Amount of material added to a wafer
Thickness*
Amount of material added to a wafer, must be 0 .. 1 µm
0 .. 1 µm
Batch sizes 100 mm: 9, 150 mm: 2
Material aluminum/silicon [98:2]
Wafer size
Wafer size