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Polyimide deposition and curing (Durimide): View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Evaporation
LPCVD
Low-stress SiN deposition
Miscellaneous deposition
Oxidation
PECVD
Spin casting
Sputtering
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
on front
Polyimide deposition and curing (Durimide)
on front
1
Spin casting (Durimide)
2
Polyimide Softbake (hotplate-Durimide)
3
Furnace anneal (Nitrogen)
Process characteristics:
Curing temperature
Tube furnace: 300-400C.
Blue M Oven: 200-240C.
Curing temperature
*
°C
Tube furnace: 300-400C. Blue M Oven: 200-240C., must be 200 .. 400 °C
200 .. 400 °C
Curing time
Curing time
*
min
must be 30 .. 240 min
30 .. 240 min
Material
32A: Pre-imidized polyimide.
115A: Polyimide pre-cursor
Material
*
Durimide 115A
Durimide 32A
32A: Pre-imidized polyimide. 115A: Polyimide pre-cursor
PI Curing tool
PI Curing tool
*
Blue M oven
Tube furnace
Thickness
Thickness
*
µm
must be 2.7 .. 11 µm
2.7 .. 11 µm
Wafer size
Wafer size
75 mm
100 mm