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Low-stress SiN deposition: Page 1 of 1
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Evaporation
LPCVD
Low-stress SiN deposition
Miscellaneous deposition
Oxidation
PECVD
Spin casting
Sputtering
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
Low-stress SiN deposition
Deposition processes for low stress silicon nitride.
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Process
Low Stress silicon nitride LPCVD (<300 MPa)
Low Stress silicon nitride LPCVD (200 MPa)
Super low stress silicon nitride LPCVD (50 MPa)
Low-stress silicon nitride LPCVD ( <120 MPa)
Low-stress silicon nitride LPCVD ( <200 MPa)
Low-stress silicon nitride LPCVD (<300 MPa)
Low-stress silicon nitride LPCVD (<50 MPa)
Low Stress silicon nitride LPCVD (300 MPa)
Silicon Nitride PECVD (STS)
Low-stress silicon nitride LPCVD ( <100 MPa)
Low-stress silicon nitride LPCVD ( <350 MPa)
Silicon nitride (stress controlled) PECVD
Low-stress silicon nitride LPCVD ( <120 MPa)
Low-stress silicon nitride LPCVD ( <200 MPa)
