VLR 700 Cluster -Chlorine Etch Chamber |
|
|---|---|
| Model | VLR 700 |
| Type | commercial |
| Equipment Characteristics | |
| Batch sizes | 100 mm: 25 |
| Wafer diameter(s) List or range of wafer diameters the tool can accept |
100 mm |
| Wafer geometry Types of wafers this equipment can accept |
1-flat |
| Wafer holder Device that holds the wafers during processing. |
cassette |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
quartz (fused silica), gallium phosphide, indium phosphide, gallium arsenide, silicon |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 700 µm |
